The fabrication of macroporous polysilicon by nanosphere lithography

Chien Fat Chau, Tracy Melvin

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200 nm and 500 nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50-500 nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.

Original languageEnglish
Article number064012
JournalJournal of Micromechanics and Microengineering
Volume18
Issue number6
DOIs
Publication statusPublished - 01 Jun 2008

Fingerprint

Nanospheres
Polysilicon
Lithography
Fabrication
Polymers
Ions
Photonic devices
Porous silicon
Silicon
Self assembly
MEMS
Masks
Monolayers
Evaporation
Metals
Substrates
Processing

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

@article{9c10d092cd244a72b2b20eae4df8c7fa,
title = "The fabrication of macroporous polysilicon by nanosphere lithography",
abstract = "The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200 nm and 500 nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50-500 nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.",
author = "Chau, {Chien Fat} and Tracy Melvin",
year = "2008",
month = "6",
day = "1",
doi = "10.1088/0960-1317/18/6/064012",
language = "English",
volume = "18",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing Ltd.",
number = "6",

}

The fabrication of macroporous polysilicon by nanosphere lithography. / Chau, Chien Fat; Melvin, Tracy.

In: Journal of Micromechanics and Microengineering, Vol. 18, No. 6, 064012, 01.06.2008.

Research output: Contribution to journalArticle

TY - JOUR

T1 - The fabrication of macroporous polysilicon by nanosphere lithography

AU - Chau, Chien Fat

AU - Melvin, Tracy

PY - 2008/6/1

Y1 - 2008/6/1

N2 - The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200 nm and 500 nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50-500 nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.

AB - The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200 nm and 500 nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50-500 nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.

UR - http://www.scopus.com/inward/record.url?scp=57249091616&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=57249091616&partnerID=8YFLogxK

U2 - 10.1088/0960-1317/18/6/064012

DO - 10.1088/0960-1317/18/6/064012

M3 - Article

AN - SCOPUS:57249091616

VL - 18

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 6

M1 - 064012

ER -