Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application

Haroon Rashid, Kazi Sajedur Rahman, Mohammad Istiaque Hossain, Ammar Ahmed Nasser Al-Kahtani, Fahhad H. Alharbi, Md Akhtaruzzaman, Nowshad Amin

Research output: Contribution to journalArticle

Abstract

DC magnetron sputtering was utilized to grow thin layers of molybdenum (Mo) on top of soda lime glass substrates. Deposition power was varied for suitable characteristics of films grown at various DC powers, i.e. 100 W, 150 W and 200 W. Thin Mo film of approximately 580 nm thickness was successfully grown at DC power of 100 W at room temperature. Structural, morphological, electrical and optical properties of Mo thin films were analyzed. XRD patterns revealed Mo films to be monocrystalline in nature and only one peak was observed corresponding to the (1 1 0)cub reflection plane at 2θ = 40.5°. Exceptionally dense microstructure was found for surface morphology observation by AFM and FESEM. Increasing deposition power resulted in coarser surface of the grown films. The minimum average surface roughness was found to be around 0.995 nm. Scotch tape adhesion test was performed to validate adhesion. Grown Mo films were found metallic in nature with electrical resistivity of 2.64 × 10−5 Ω-cm. Furthermore, it was found that by increasing deposition power, the electrical resistivity could further be reduced.

Original languageEnglish
Article number102515
JournalResults in Physics
Volume14
DOIs
Publication statusPublished - 01 Sep 2019

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molybdenum
magnetron sputtering
physical properties
direct current
electrical properties
thin films
adhesion tests
electrical resistivity
calcium oxides
tapes
surface roughness
adhesion
atomic force microscopy
optical properties
microstructure
glass
room temperature

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

Cite this

Rashid, Haroon ; Rahman, Kazi Sajedur ; Hossain, Mohammad Istiaque ; Nasser Al-Kahtani, Ammar Ahmed ; Alharbi, Fahhad H. ; Akhtaruzzaman, Md ; Amin, Nowshad. / Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application. In: Results in Physics. 2019 ; Vol. 14.
@article{3f9183302beb440aba7dc235e90cd82e,
title = "Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application",
abstract = "DC magnetron sputtering was utilized to grow thin layers of molybdenum (Mo) on top of soda lime glass substrates. Deposition power was varied for suitable characteristics of films grown at various DC powers, i.e. 100 W, 150 W and 200 W. Thin Mo film of approximately 580 nm thickness was successfully grown at DC power of 100 W at room temperature. Structural, morphological, electrical and optical properties of Mo thin films were analyzed. XRD patterns revealed Mo films to be monocrystalline in nature and only one peak was observed corresponding to the (1 1 0)cub reflection plane at 2θ = 40.5°. Exceptionally dense microstructure was found for surface morphology observation by AFM and FESEM. Increasing deposition power resulted in coarser surface of the grown films. The minimum average surface roughness was found to be around 0.995 nm. Scotch tape adhesion test was performed to validate adhesion. Grown Mo films were found metallic in nature with electrical resistivity of 2.64 × 10−5 Ω-cm. Furthermore, it was found that by increasing deposition power, the electrical resistivity could further be reduced.",
author = "Haroon Rashid and Rahman, {Kazi Sajedur} and Hossain, {Mohammad Istiaque} and {Nasser Al-Kahtani}, {Ammar Ahmed} and Alharbi, {Fahhad H.} and Md Akhtaruzzaman and Nowshad Amin",
year = "2019",
month = "9",
day = "1",
doi = "10.1016/j.rinp.2019.102515",
language = "English",
volume = "14",
journal = "Results in Physics",
issn = "2211-3797",
publisher = "Elsevier BV",

}

Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application. / Rashid, Haroon; Rahman, Kazi Sajedur; Hossain, Mohammad Istiaque; Nasser Al-Kahtani, Ammar Ahmed; Alharbi, Fahhad H.; Akhtaruzzaman, Md; Amin, Nowshad.

In: Results in Physics, Vol. 14, 102515, 01.09.2019.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application

AU - Rashid, Haroon

AU - Rahman, Kazi Sajedur

AU - Hossain, Mohammad Istiaque

AU - Nasser Al-Kahtani, Ammar Ahmed

AU - Alharbi, Fahhad H.

AU - Akhtaruzzaman, Md

AU - Amin, Nowshad

PY - 2019/9/1

Y1 - 2019/9/1

N2 - DC magnetron sputtering was utilized to grow thin layers of molybdenum (Mo) on top of soda lime glass substrates. Deposition power was varied for suitable characteristics of films grown at various DC powers, i.e. 100 W, 150 W and 200 W. Thin Mo film of approximately 580 nm thickness was successfully grown at DC power of 100 W at room temperature. Structural, morphological, electrical and optical properties of Mo thin films were analyzed. XRD patterns revealed Mo films to be monocrystalline in nature and only one peak was observed corresponding to the (1 1 0)cub reflection plane at 2θ = 40.5°. Exceptionally dense microstructure was found for surface morphology observation by AFM and FESEM. Increasing deposition power resulted in coarser surface of the grown films. The minimum average surface roughness was found to be around 0.995 nm. Scotch tape adhesion test was performed to validate adhesion. Grown Mo films were found metallic in nature with electrical resistivity of 2.64 × 10−5 Ω-cm. Furthermore, it was found that by increasing deposition power, the electrical resistivity could further be reduced.

AB - DC magnetron sputtering was utilized to grow thin layers of molybdenum (Mo) on top of soda lime glass substrates. Deposition power was varied for suitable characteristics of films grown at various DC powers, i.e. 100 W, 150 W and 200 W. Thin Mo film of approximately 580 nm thickness was successfully grown at DC power of 100 W at room temperature. Structural, morphological, electrical and optical properties of Mo thin films were analyzed. XRD patterns revealed Mo films to be monocrystalline in nature and only one peak was observed corresponding to the (1 1 0)cub reflection plane at 2θ = 40.5°. Exceptionally dense microstructure was found for surface morphology observation by AFM and FESEM. Increasing deposition power resulted in coarser surface of the grown films. The minimum average surface roughness was found to be around 0.995 nm. Scotch tape adhesion test was performed to validate adhesion. Grown Mo films were found metallic in nature with electrical resistivity of 2.64 × 10−5 Ω-cm. Furthermore, it was found that by increasing deposition power, the electrical resistivity could further be reduced.

UR - http://www.scopus.com/inward/record.url?scp=85069568870&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85069568870&partnerID=8YFLogxK

U2 - 10.1016/j.rinp.2019.102515

DO - 10.1016/j.rinp.2019.102515

M3 - Article

VL - 14

JO - Results in Physics

JF - Results in Physics

SN - 2211-3797

M1 - 102515

ER -