Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source

Research output: Contribution to journalArticle

2 Citations (Scopus)


The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.

Original languageEnglish
Pages (from-to)736-739
Number of pages4
JournalMeasurement: Journal of the International Measurement Confederation
Issue number8
Publication statusPublished - 01 Oct 2006


All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Electrical and Electronic Engineering

Cite this