Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source

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Abstract

The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.

Original languageEnglish
Pages (from-to)736-739
Number of pages4
JournalMeasurement: Journal of the International Measurement Confederation
Volume39
Issue number8
DOIs
Publication statusPublished - 01 Oct 2006

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Magnetic field measurement
Plasma sources
Inductively coupled plasma
Magnetic fields
low frequencies
Measurement errors
magnetic fields
Carrier concentration
magnetic probes
Electric fields
profiles
Plasmas
induction
coils
chambers
Gases
electric fields
gases

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

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title = "Magnetic field measurements for N2 and H2 discharges from a low frequency RF inductively coupled plasma source",
abstract = "The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.",
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AB - The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.

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