High-k Dielectric Thickness and Halo Implant on Threshold Voltage Control

S. K. Mah, Ibrahim Ahmad, Pin Jern Ker, Z. A. Noor Faizah

Research output: Contribution to journalArticle

Abstract

High-k dielectric oxides have been used to replace the widely used silicon dioxide (SiO2) gate dielectrics to overcome physical limits of transistor scaling. The thickness of high-k gate dielectric influences the threshold voltage (VTH) and off-state leakage current (IOFF). A device with high drive current (ION) and low IOFF gives a high on-off current ratio (ION/IOFF), which leads to a faster switching speed for the N-type Metal Oxide Semiconductor Field Effect Transistor (NMOS). In order to achieve the best ION/IOFF ratio for a predetermined range of VTH, halo implant was used to adjust the threshold voltage. The finding shows that optimum VTH and ION/IOFF ratio can be achieved by selecting the most suitable halo implant dose in a virtually fabricated 14nm gate-length La2O3-based NMOS device with varying high-k dielectric oxide thickness.

Original languageEnglish
Pages (from-to)1-5
Number of pages5
JournalJournal of Telecommunication, Electronic and Computer Engineering
Volume10
Issue number2-6
Publication statusPublished - 01 Jan 2018

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All Science Journal Classification (ASJC) codes

  • Hardware and Architecture
  • Computer Networks and Communications
  • Electrical and Electronic Engineering

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