Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release

Chien Fat Chau, Tracy Melvin

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500μm thick silicon 〈100〉 wafer, which has been etched to provide 4×4mm 2membranes of 50μm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ± 5nm) and smooth sidewalls to a depth of ∼300nm, in a hexagonal close-packed pattern of 200nm nearest neighbour. The porosity of typical fabricated samples is 31.5%. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.

Original languageEnglish
Article number085028
JournalJournal of Micromechanics and Microengineering
Volume22
Issue number8
DOIs
Publication statusPublished - 01 Aug 2012

Fingerprint

Silicon
Temperature sensors
Membranes
Fabrication
Pharmaceutical Preparations
Nanopores
Silicon wafers
MEMS
Porosity

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

@article{895cde1c9f70407e94eeb4a882dee3e4,
title = "Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release",
abstract = "The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500μm thick silicon 〈100〉 wafer, which has been etched to provide 4×4mm 2membranes of 50μm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ± 5nm) and smooth sidewalls to a depth of ∼300nm, in a hexagonal close-packed pattern of 200nm nearest neighbour. The porosity of typical fabricated samples is 31.5{\%}. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.",
author = "Chau, {Chien Fat} and Tracy Melvin",
year = "2012",
month = "8",
day = "1",
doi = "10.1088/0960-1317/22/8/085028",
language = "English",
volume = "22",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing Ltd.",
number = "8",

}

TY - JOUR

T1 - Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release

AU - Chau, Chien Fat

AU - Melvin, Tracy

PY - 2012/8/1

Y1 - 2012/8/1

N2 - The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500μm thick silicon 〈100〉 wafer, which has been etched to provide 4×4mm 2membranes of 50μm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ± 5nm) and smooth sidewalls to a depth of ∼300nm, in a hexagonal close-packed pattern of 200nm nearest neighbour. The porosity of typical fabricated samples is 31.5%. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.

AB - The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500μm thick silicon 〈100〉 wafer, which has been etched to provide 4×4mm 2membranes of 50μm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ± 5nm) and smooth sidewalls to a depth of ∼300nm, in a hexagonal close-packed pattern of 200nm nearest neighbour. The porosity of typical fabricated samples is 31.5%. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.

UR - http://www.scopus.com/inward/record.url?scp=84866327113&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84866327113&partnerID=8YFLogxK

U2 - 10.1088/0960-1317/22/8/085028

DO - 10.1088/0960-1317/22/8/085028

M3 - Article

VL - 22

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 8

M1 - 085028

ER -