CVD flow field modeling using the Quiet Direct Simulation (QDS) method

H. M. Cave, C. W. Lim, M. C. Jermy, J. S. Wu, M. R. Smith, S. P. Krumdieck

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet development in a Pulsed Pressure Chemical Vapour Deposition (PP-CVD) reactor. QDS is a novel method of gas flow simulation which is able to compute true-direction fluxes of mass, momentum and energy in a computationally efficient and accurate manner. The scheme is ideal for the simulation of novel CVD processes like PP-CVD which include highly unsteady flow structures and which has previously proved extremely difficult to simulate. Here, the axisymmetric QDS solver is outlined and the injection phase of a PP-CVD reactor is simulated.

Original languageEnglish
Title of host publicationECS Transactions - EuroCVD 17/CVD 17
Pages389-396
Number of pages8
Edition8 PART 1
DOIs
Publication statusPublished - 01 Dec 2009
Event17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society - Vienna, Austria
Duration: 04 Oct 200909 Oct 2009

Publication series

NameECS Transactions
Number8 PART 1
Volume25
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society
CountryAustria
CityVienna
Period04/10/0909/10/09

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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    Cave, H. M., Lim, C. W., Jermy, M. C., Wu, J. S., Smith, M. R., & Krumdieck, S. P. (2009). CVD flow field modeling using the Quiet Direct Simulation (QDS) method. In ECS Transactions - EuroCVD 17/CVD 17 (8 PART 1 ed., pp. 389-396). (ECS Transactions; Vol. 25, No. 8 PART 1). https://doi.org/10.1149/1.3207617